A Measurement System with High Precision and Large Range for Structured Surface Metrology Based on Atomic Force Microscope

With the rapid and continuous development of nanomanufacturing technology, demands for both large range high precision metrology structured surfaces are becoming increasingly urgent. This paper proposes a metrological measurement system based on commercial atomic force microscope. By using nano-positioning platform from SIOS, expands 110 μm × 20 to 25 mm 5 mm. A signal amplifier with low noise common mode rejection ratio that decreases level 2 nm is designed. Integration system, processing, calibration whole introduced. Three experimental studies carried out an ultrahigh step, deposition grating, cutting tool. The results demonstrate repeatability reproducibility in vertical lateral directions. repeating 10 times measurement, expended uncertainties step grating 36.24 0.60 nm, respectively. Additionally, tool tip conducted illustrate performance system. Ra Rz values arc ripple 29.8 189